PUBLICATIONS:

Book Chapters

1. Jin-Goo Park, Nagarjuna Reddy Paluvai, R. Prasanna Venkatesh, Metal surface chemical composition and morphology, K.A Reinhardt and W. Kern (eds.) Handbook of Silicon wafer cleaning technology, 3rd Edition, 579-619 (2018)

2. R. Prasanna Venkatesh, Min-Su Kim, Jin-Goo Park, Contamination Removal from UV and EUV Photomasks, Rajiv Kohli and K.L. Mittal (Ed) Developments in Surface contamination and cleaning, vol. 9, 135 -172 (2017)

PUBLICATIONS IN REFEREED JOURNAL PAPERS:


1. Prince Kumar Baranwal, R. Prasanna Venkatesh, Electrochemical investigation of synergetic effect of thiosulphate and chloride ions in carbon steel corrosion, Journal of Materials Research and Technology (2018) - Accepted

2. Sudip Das, Prince Kumar Baranwal, R. Prasanna Venkatesh, Effect of cations on carbon steel corrosion in chloride media, Corrosion Reviews (2018) 36, 395-404

3. Prince Kumar Baranwal, R. Prasanna Venkatesh, Investigation of carbon steel corrosion in ammonium chloride solutions using electrochemical impedance spectroscopy, Journal of Solid state Electrochemistry (2017) 21,1373-1384

4. M.S.G. Nandagopal, E. Nakeeran, R. Prasanna Venkatesh, N. Selvaraju, Advance microfluidic approach over conventional batch and CTR for improving the efficiency of E-Coli cell Lysis by CuO nanoparticles International Journal of Chemical Rector Engineering, (2017) ) 20160105

5. T-Y Kwon, B-J Cho, R. Prasanna Venkatesh, M. Ramachandran, H-M Kim, C-K Hong, J-G Park, “Effect of silicon dioxide hardness on scratches in interlevel dielectric chemical mechanical Polishing”, Tribology Transactions (2014) 57, 190-197

6. R. Prasanna Venkatesh, T–Y Kwon, Y.N. Prasad, S. Ramanathan and J-G. Park, “Characterization of TMAH based cleaning solution for Post Cu-CMP application”, Microelectronic Engineering (2013) 102, 74-80

7. B. J Cho, R. Prasanna Venkatesh, T.Y. Kwon and J-G. Park “Modification of Ni based surface with V-SAM coatings for CMP applications, International Journal of Electrochemical Science (2013) 8, 4723-4734.

8. S. Sakthivel and R. Prasanna Venkatesh, Solid state synthesis of nano-mineral particles, International Journal of mining science and technology (2012) 5, 651-655

9. R. Prasanna Venkatesh, B.J. Cho, S. Ramanathan and J-G. Park “EIS analysis of BTA removal by TMAH for post Cu CMP cleaning”, Journal of The Electrochemical Society (2012) 159, C447-C452

10. H-M. Kim, R. Prasanna Venkatesh, Tae-Young K and J-G. Park, Influence of anionic polyelectrolyte addition on ceria dispersion behavior for quartz chemical mechanical polishing, J. Colloid and sciences A-Physicochemical and Engineering Aspects (2012) 411, 122-128

11. R. Prasanna Venkatesh, Y. N. Prasad, Tae –Young, Y.J. Kang and J-G. Park, Effect of alkaline pH on polishing and etching of single and poly crystal silicon, Japanese Journal Of Applied Physics (2012) 51, 071301(1-6)

12. D.J. Kim, J-H. Lee, S-H. Cho, M. Rizwan, R. Prasanna Venkatesh and J-G. Park, “Enhanced fluorescence by controlled surface roughness of plastic biochip” Japanese Journal of Applied Physics, (2011) 50, 06GL14 (1-4).

13. R. Prasanna Venkatesh and S. Ramanathan, “Electrochemical characterization of Cu dissolution and chemical mechanical polishing of Cu in NH4OH – H2O2 based slurries”, Journal of Applied Electrochemistry (2010) 40,767-776

14. R. Prasanna Venkatesh and S. Ramanathan, “EIS studies for copper dissolution in glycine – H2O2 solutions”, Journal of Solid State Electrochemistry, (2010) 14, 2057-2064

15. R. Prasanna Venkatesh, M. Bhaskar, S. Sakthivel, N.Selvaraju and M. Velan “Pilot plant studies on accelerated deactivation of hydrotreating catalysts”, Petroleum Science and Technology (2010) 28, 93-102

INTERNATIONAL CONFERENCES PROCEEDINGS:

1. Upasana Mahanta, R. Prasanna Venkatesh, Tamal Banerjee and S. A. Illangovana. Ionic Liquids as Electrolytes for electrical double layer capacitor. Insights from molecular dynamics simulation and electrochemical characterization., International Symposium on Solubility Phenomena and Related Equilibrium Processes (ISSP 2018) July 15-20 2018, Tours, France

2. Upasana Mahanta, R. Prasanna Venkatesh, Tamal Banerjee and S. A. Illangovan. Investigation of ionic conductance of ionic liquids for electrical double layer capacitor using molecular dynamics simulation., International Symposium on Solubility Phenomena and Related Equilibrium Processes (ISSP 2018) July 15-20 2018, Tours, France

3. Prince Kumar, Sudip Das and R. Prasanna Venkatesh “Effect of cations in carbon steel corrosion in chloride media” 231st ECS meeting, New Orelans, USA, 2017

4. Anusuya Talukdar and R. Prasanna Venkatesh, “Effect of H2S and acetic acid on CO2 corrosion of carbon steel”, CORCORN 2017, 17-20 September 2017, Mumbai, India (Received Best Paper Award)

5. Prince Kumar, Abhilash Kumar and R. Prasanna Venkatesh, “Investigation of carbon steel corrosion in ammonium chloride solutions under stirring conditions”, CORCORN 2017, 17-20 September 2017, Mumbai, India

6. P Agarwal, Abhilash Kumar, Sunil Prakash and R. Prasanna Venkatesh, “EIS measurements of naphthenic acid corrosion on carbon Steel, 17th Asian Pacific corrosion Control Conference , Jan 27-30 2016, IIT Bombay

7. R. Prasanna Venkatesh, T-Y. Kwon and J-G Park, "Material removal mechanism of single and polycrystalline silicon in alkaline slurry, China Semiconductor Technology International Conference (2013) Mar 19-21, Shanghai, China, , ECS Transcations, 52 (1) 545-550

8. R. Prasanna Venkatesh, H-M. Kim, S. Ramanathan and J-G. Park “Electrochemical impedance spectroscopy analysis of BTA removal during post Cu CMP cleaning”, 220th ECS meeting (2011) Oct 9-14, Boston, USA, ECS Transcations, 41 (5) 323-330

9. R. Prasanna Venkatesh, Y. Nagendra Prasad and S. Ramanathan, “Electrochemical characterization of Cu chemical mechanical polishing in aminoacids – H2O2 system, , International Conference on Planarization and Technology (2011) Nov 9-11, Seoul, S. Korea, 374-381,

10. Jung-Soo Lim, R. Prasanna Venkatesh and J-G. Park “Effect of pump pulsation on particle contamination on wafer surface in wet cleaning system”, 220th ECS meeting 2011, Oct 9-14, Boston, USA , ECS Transactions, 41 (5) 221-227

11. Y. N. Prasad, R. Prasanna Venkatesh, Tae-Young K and J-G. Park, “ Formulation of alkaline solution for post copper CMP cleaning, International Conference on Planarization and Technology (2010), Arizona, USA, 325-355